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DOI will be assigned to every published paper at no additional charge. 📢 Call for Papers — Volume 13, Issue 9 (September 2026) | Submission Deadline: September 30, 2026 | Rapid peer review: 2–3 days | Impact Factor: 7.37 (SJIF 2026)

Paper Details

📄 IJAERD-OJS-6020

Comparative analyis and study between 180nm and 90nm

Author(s):Shreya Patel, Viral Patel, Rakesh Koringa, Himani Patel, Sachin Patel
Institution:Electronics & Communication, Sigma Institute of Engineering
Published In:Vol. 4, Issue 13 — January 2017
Page No.:-
Domain:Engineering
Type:Research Paper
ISSN (Online):2348-4470
ISSN (Print):2348-6406
Abstract

Leakage components are very important for estimation and reduction of leakage power especially in submicron regimes in which threshold voltage, gate oxide thickness and channel length scale downwards. In present era itprovides motivation to design a low power SRAM. This paper presents comparative analysis and study in both 180nmand 90nm, from which one can indentify that how the leakage issues become severe if technology node go downwards.

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🕮 How to Cite

Shreya Patel, Viral Patel, Rakesh Koringa, Himani Patel, Sachin Patel, “Comparative analyis and study between 180nm and 90nm”, International Journal of Advance Engineering and Research Development (IJAERD), Vol. 4, Issue 13, pp. -, January 2017.

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27 Sep 2026
Vol. 13 | Issue 9
September 2026